FREM
Flex-Ray Reflection EUV Microscopy
FREM
A Flex Ray EUV Microscope (FREM) is a type of microscope which can measure EUV mask CD and defect
printability. Obtaining EUV actinic images during the EUV blank, EUV mask fabrication, and periodic
EUV mask re-qualification at Fab is very important to enhance the yield and productivity of EUV lithography.
printability. Obtaining EUV actinic images during the EUV blank, EUV mask fabrication, and periodic
EUV mask re-qualification at Fab is very important to enhance the yield and productivity of EUV lithography.
Based on the success of a former Scanning Reflection EUV Microscope (SREM), ESOL has improved productivity,
stability, and EUV scanner-like flex-ray illumination system. FREM can support both 0.33NA and 0.55NA
anamorphic lithography,providing cost-effective solution.
stability, and EUV scanner-like flex-ray illumination system. FREM can support both 0.33NA and 0.55NA
anamorphic lithography,providing cost-effective solution.
- Advantages
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- Low cost of ownership of EUV mask imaging
- Long MTBF and Short MTTR
- Small foot print
- High extendibility to future node
Defect Image
Reference image- Applications
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- EUV mask pattern’s aerial image analysis
- EUV mask defect and pattern verification after repair
- Verification for compensation EUV phase defect repair
- EUV blank defect shift and size verification
- EUV mask lifetime monitoring
- EUV mask blind layer verification
- Printable actinic defect disposition from DUV inspection
- result with ESOL actinic review and algorithm