ESOL

PRODUCT
Leading Solution Provider for EUV Lithography
EUVO TM
EUVO TM

EUVO TM (Extreme Ultra Violet Oscillator) is based on High-order
Harmonic Generation driven by ultra-fast laser.
The system has excellent coherence, low divergence, tunable wavelength,
and table-top size footprint.
It is compact, easy to use, reliable, and cost effective EUV light sources.
It is uniquely suited for Infrastructure of EUV Lithography
and its applications.

euvo100TM

Main Features

  • Ultra fast drive laser
  • Vacuum system
  • Laser beam position stabilizer
  • Status monitoring
    • Laser parameter
    • EUV beam
  • Various phase matching control
    • Optic control
    • Laser parameter
    • Gas cell geometry
    • Laser & gas cell interaction
    • Adaptive wave-front of the driving laser pulse
  • 13.5nm Beam Image


  • EUV Wavefront


  • EUV Spectral bandwidth

  • EUV Power Stability

Application

  • Mask defect review system
  • EUV transmittance/reflectance measurement system
  • EUV interferometer
  • Coherent scattering microscopy

EUV Position Stability

HHG Video

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